Design and optimization of advanced photonic structures such as grating couplers, waveguide grating antennas, distributed feedback (DFB) lasers, and other PIC elements using Finite-Difference Time-Domain (FDTD) methods.
Converting device designs into GDSII/DXF layouts suitable for cleanroom fabrication, ensuring compatibility with foundry process rules and lithography constraints.
Development of anti-reflection (AR) coatings, high-reflectivity (HR) mirrors, Bragg reflectors, and dielectric stack filters using Transfer Matrix Method (TMM) simulations for precise spectral control.
Support in defining lithography workflows, material stacks, exposure parameters, and etch processes to ensure seamless transition from design to fabrication.
Designed components can be fabricated and supplied through our in-house capabilities and trusted partner facilities, providing a complete design-to-product pipeline.